-
EPFL MagneticForceMicroscopy LateralForceMicroscopy graphene_hybrid DiffractiveOpticalElements HanyangUniv IMT_Bucharest LiIonBattery molecular_beam StrontiuTitanate NiFe HighResolution Temperature cannabis PrCurve Co/Cr/Pt CVD Pvdf Inorganic_Compound suspended_graphene Leakage Piezo PetruPoni_Institute DNAProtein StainlessSteel polyvinyl acetate non_contact Current Vac DNA IVSpectroscopy CntFilm Adhesive Temasek_Lab Pinpoint
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)