-
Vortex Memory Fluoride InsulatorFilm Sulfur VortexCore NUSNNI DNA InorganicCompound block_copolymer Hafnia exfoliate EFM Pinpoint PFM dielectric trench kelvin probe force microscopy Sphere PiezoelectricForceMicroscopy Gallium_Arsenide Growth Hafnium_dioxide SKKU University_of_Regensburg atomic_steps Permalloy thermal_property Ecoli Force-distance OxideLayer IIT-chennai PolymerPatterns Ferroelectric Nanofiber IndiumTinOxide Korea
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
MoSi₂ Hard defect repair
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 6μm, 0.5μm×1μm
- Pixel Size : 512×64 for 6μm2, 512×34 for 0.5μm×1μm