-
Vacuum Polystyrene conductive EvatecAG Dimethicone SPMLabs amplitude_modulation Organic Insulator CuFoil Semiconductor optoelectronics Genetic Microchannel SiWafer dielectric_trench Tungsten CarbonNanotube Topography BismuthVanadate blended polymers phase_change MeltingPoint Bacteria DataStorage Gallium Melt KPFM vertical_PFM Austenite Blend PhaseChange Change SelfAssembly MLCC
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Photoresist pattern (post-development process)
Scanning Conditions
- System : NX-3DM
- Scan Mode: Non-contact
- Scan Rate : 0.1 Hz
- Scan Size : 2μm×10μm
- Pixel Size : 512×2048
- Cantilever : EBD-R2-NCLR (k=45N/m, f=190kHz)